| 摘要 |
Disclosed are a photomask material for preparing a photomask having excellent heat resistance, ultraviolet resistance and image strength, a photomask having the above properties and methods for the production thereof, and the present invention providesa photomask material, which comprises a glass substrate, a physical development nucleus layer and a photosensitive layer containing silver halide, the layers being consecutively formed on the transparent substrate, and a method for the production thereof, anda photomask, which comprises a transparent substrate, a physical development nucleus layer and a light shielding film formed of a predetermined pattern of a silver film derived from silver halide, the silver film being formed by the action of the physical development nucleus in said layer during development treatment, the physical development nucleus layer and the light shielding film being consecutively formed on the transparent substrate, and a method for the production thereof.
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