| 摘要 |
Compositions useful for a lift-off resist in a bilayer metal lift-off process, which comprise a mixture of at least one solvent, at least one polyglutarimide resin and an effective amount of at least one actinic-absorbing dissolution rate modifier having the formulae of (IA) or (IB):in which each R1 and R2 is selected from the group consisting of hydrogen, unsubstituted or substituted alkyl, alkoxy, nitro, halo, amide or hydroxy or a combination thereof, X is an aromatic group and R3 and R4 are selected from the group consisting of hydrogen, an unsubstituted or substituted alkyl or arylsulfonyl; each m is an integer from 1 to 5 and each n is an integer from 1 to 4.
|
