发明名称 SUBSTRATE-PROCESSING METHOD AND SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a method for controlling a system in such a way that the possibility that a substrate is subjected to excessive processing by chemical is eliminated and the processing result of the substrate always becomes constant, even if the temperature or concentration of the chemical supplied into the processing tank becomes high, when chemical is supplied into a processing bath, the processing tank is filled with chemicals, the supply of the chemicals into the treatment bath is stopped, and the substrate is surface-processed by holding it in a state, where it is immersed in chemical in the treatment bath. SOLUTION: The temperature or concentration of chemical supplied into the treatment bath is measured, the average value of a measurement value is calculated at each measurement, and processing time is corrected by using the average value until time which is set as chemical supply time passes from the supply start time of chemical into the treatment bath 10. When correction processing time is elapsed, the supply of chemical into the treatment bath is stopped and a processing is terminated, even if setting time has not elapsed.
申请公布号 JP2001284313(A) 申请公布日期 2001.10.12
申请号 JP20000090844 申请日期 2000.03.29
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YAMAMURA MASAAKI;NAKAJIMA KAZUO;YOKOGAWA ARINORI
分类号 C23F1/08;H01L21/306;(IPC1-7):H01L21/306 主分类号 C23F1/08
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