发明名称 Semiconductor device and manufacturing method thereof
摘要 A semiconductor device having high reliability, in which TFTs with appropriate structures for the circuit functions are arranged, is provided. Gate insulating films (115) and (116) of a driver TFT are designed thinner than a gate insulating film (117) of a pixel TFT in a semiconductor device having a driver circuit and a pixel section on the same substrate. In addition, the gate insulating films (115) and (116) of the driver TFT and a dielectric (118) of a storage capacitor are formed at the same time, so that the dielectric (118) may be extremely thin, and a large capacity can be secured.
申请公布号 US2001029070(A1) 申请公布日期 2001.10.11
申请号 US20010874670 申请日期 2001.06.05
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;KOYAMA JUN;SHIBATA HIROSHI;FUKUNAGA TAKESHI
分类号 G02F1/1362;H01L21/77;H01L21/84;H01L27/12;H01L27/13;H01L29/04;H01L29/423;H01L29/786;(IPC1-7):H01L21/00;H01L21/20;H01L21/301;H01L21/46;H01L21/78 主分类号 G02F1/1362
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