| 摘要 |
<p>A thin film manufacturing method comprises the step of forming on a substrate a thin film composed of portions which correspond to the regions of the substrate and the qualities of which are different from one another by selectively heating the substrate and etching the thin film so as to selectively remove a predetermined portion of the thin film and to pattern the thin film into a predetermined shape. By such a method, the deterioration of the device performance is suppressed, the production process temperature can be lowered, and the number steps of the production process can be reduced.</p> |
