MULTIBEAM EXPOSURE APPARATUS COMPRISING MULTIAXIS ELECTRON LENS, MULTIAXIS ELECTRON LENS FOR FOCUSING ELECTRON BEAMS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要
<p>An electron beam exposure apparatus characterized by comprising a multiaxis electron lens having lens apertures for passing therethrough electron beams and independently focusing the electron beams and dummy apertures for not passing therethrough the electron beams. The multiaxis electron lens has the dummy apertures preferably around the periphery of the region where the lens apertures are provided. The multiaxis electron lens may have the dummy apertures multiply around the periphery of the region where the lens apertures are provided.</p>
