METHOD AND INSTRUMENT FOR MEASURING OPENING RATIO FOR THIN FILM

摘要

PROBLEM TO BE SOLVED: To easily measure an opening ratio for thin films by utilizing a characteristic that spectroscopic reflection spectra shift in response to the opening ratio. SOLUTION: This method comprises a step S1 for measuring the spectroscopic reflection spectra, a step S4 for extracting only a component of the first thin film as an extracted spectroscopic reflection spectrum, a step S5 for preparing a theoretical spectroscopic reflection spectrum of the first thin film as a theoretical spectroscopic reflection spectrum, steps S6-S10 for calculating the opening ratio of the first thin film to the second thin film based on a difference between the extracted spectroscopic reflection spectrum and the theoretical spectroscopic reflection spectrum, which are excecuted respectively. An influence by the second thin film is found based on the difference between the extracted spectroscopic reflection spectrum and the theoretical spectroscopic reflection spectrum to find the opening ratio of the first thin film to the second thin film.