| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material which unnecessitates the troublesome checkout and maintenance of an automatic development processing machine by a user and facilitates the handling of the machine. SOLUTION: The photosensitive material has a photopolymerizable layer based on a photopolymerizable composition and a protective layer containing a water-soluble polymer and a preservative or a chelating agent on the photopolymerizable layer. |
