| 摘要 |
<p>PROBLEM TO BE SOLVED: To suppress generation of a scratch in a polished surface, by reducing concentration of rough grains in an abrasive grain dispersed fluid by containing it. SOLUTION: This polishing method, applying polishing while supplying an abrasive grain dispersed fluid containing it, is characterized by polishing while supplying the above abrasive grain dispersed fluid dispersion treated by a high pressure homogenizer and/or ultrasonic homogenizer.</p> |
