OPHTHALMOLOGIC OPTICAL CHARACTERISTIC MEASURING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an ophthalmologic optical characteristic measuring system having a projection unit for projecting a microscopic light source image to an eyeground of a subject's eye and a wavefront detecting unit for detecting a wavefront of a luminous flux irradiated from a pupil of the eye to be examined by a reflected light from the eyeground. SOLUTION: The projection unit projects the microscopic light source image to the eyeground of the subject's eye. The wavefront detecting unit detects the wavefront of the luminous flux irradiated from the pupil of the subject's eye by the reflected light from the eyeground. Then, crystal polarizers having at least one aberration correcting transmission surface in each of both optical paths of the projection detecting unit and the wavefront detecting unit can deflect the incident flux.