| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas cleaning unit device capable of simply cleaning local space and to provide a cleaning method using the device. SOLUTION: In the gas cleaning unit device A using a photoelectron and/or a photocatalyst, an inlet part 19 and an outlet part 20 of the gas to be treated are provided at the side surface of the unit device, and the size of the inlet part has the ratio of 10-0. 35 to the side surface area 1 of the unit device, and the cleaning unit device is provided with a photoelectron releasing material 13 and/or the photocatalyst 12 and a radiation source 11 for radiating UV rays and removes the particular material and/or the harmful component in the gas, and the gas cleaning unit device is installed in the space to be cleaned to clean the space. |
