| 摘要 |
A polishing layer for chemical mechanical polishing includes a frozen binder material solution which has a liquid state at room temperature, and solid particles dispersed in the frozen binder material. The solid particles may be abrasives, such as colloidal silica or alumina, and/or non-reactive particles, such as pieces of polyurethane or polymerized resins. The polishing layer can also include a chemical etchant. The frozen polishing pad can be formed and reconditioned in situ.
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