| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method wherein a semiconductor optical device having high level of integration and a narrow width of a mesa part is formed with high yield, and to provide such semiconductor optical device. SOLUTION: An insulating film is formed by dividing the forming process into a plurality of steps, so that an electrode forming process is performed on a flat insulating film. As a result, the thickness of a photoresist layer used in the electrode forming process is reduced.</p> |
