| 摘要 |
PROBLEM TO BE SOLVED: To provide a mark position detecting apparatus and method, which enable accurate detection of the position of a mark for measuring matching deviation, regardless of the symmetry or asymmetry in the shape of the cross section thereof. SOLUTION: In a mark position detector 1 for detecting the position of a mark for measuring the matching deviation, formed on a semiconductor substrate is provided with a light source 13 for irradiating a mark 20 with a light L1, a detection optical system 10 for detecting reflected light L2 generated from the mark 20 and a computer 50 which contains measuring waveform plotting part control 51, a theoretical waveform generation part 57, waveform collation part 53 and a matching deviation computing part 55. The measuring waveform generation part 51 outputs a measuring waveform, indicating the intensity distribution of the reflected light L2, corresponding to the shape of the cross section of the mark 20, based of the results of the detection of the detection optical system 10, and the theoretical waveform generation part 57 generates theoretical waveform at a position, where the intensity of the reflected light L2 changes based on the information on the material and the thickness T1 of an SiO2 layer 23 of the mark 20, the material and the thickness T2 of an SiN layer 27 and the depths D1 and D2 of recessed parts C1 and C2. Thus, the theoretical waveform and the measured waveform are compared, based on the positional information at the point to detect the position of the mark 20. |
