| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging device and a producing method therefor, with which a gap between lenses is <=0.3μm and an aperture is high even in the high-definition solid-state imaging device. SOLUTION: A microlens 11 is provided on an undercoat layer 13 of high etching rate, and a transparent resin 12 is selectively located in the hem part of the microlens in the form of expanding that area. This producing method has a coating laminating process for a flattened layer 16 and the undercoat layer 13, a process for providing a microlens forming layer and the microlens 11, a process for applying and forming a transparent resin layer, and an etching process for selectively locating the transparent resin 12.
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