发明名称 PHOTOCURABLE/THERMOSETTING RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM FORMED THEREFROM, AND METHOD OF FORMING PATTERN WITH THE SAME
摘要 <p>A photocurable/thermosetting resin composition which comprises (A) a photosensitive prepolymer having both at least one carboxyl group and at least two ethylenically unsaturated double bonds per molecule, (B) a polymerization initiator, (C) a diluent, (D) an oxetane compound having at least two oxetanyl groups per molecule, and (E) a curing accelerator. It is alkali-developable, and can be formulated so as to be of the one-pack type. This composition and a photosensitive dry film formed therefrom are useful as various resist materials and insulating materials, in particular, a solder resist for printed circuit boards, an interlayer dielectric for build-up multilayered printed circuit boards, etc.</p>
申请公布号 WO2001073510(P1) 申请公布日期 2001.10.04
申请号 JP2001002590 申请日期 2001.03.28
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