发明名称 Protection of semiconductor fabrication and similar sensitive processes
摘要 A detection system for detecting base contamination at low concentrations in gas, for instance to protect a sensitive process, characterized in that the detection system is constructed to examine multiple amines in gas to produce a reading stoichiometrically related to the proton bonding characteristic of the multiple amines present, the detection system comprising at least two channels through which a gas to be examined passes, an amines remover located in one of the channels, at least one thermal/catalytic converter which discharges NO for each channel, and at least one chemiluminescent NO detector, whereby the total amine concentration is determined from the difference between the detected signals for the channels.
申请公布号 US6296806(B1) 申请公布日期 2001.10.02
申请号 US19970996790 申请日期 1997.12.23
申请人 EXTRACTION SYSTEMS, INC. 发明人 KISHKOVICH OLEG P.;KINKEAD DEVON A.
分类号 G01N21/76;G01N33/00;G03F7/20;(IPC1-7):G01N21/76 主分类号 G01N21/76
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