| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pellicle for lithography with a high performance pellicle membrane using an amorphous perfoluroropolymer as the material of the membrane, excellent in peelability from a substrate in the formation of the membrane, free of photogradation and decomposition due to the absorption of short-wavelength ultraviolet light even when irradiated with the light for a long the time and having a long service life and a high invariable transmittance. SOLUTION: In the pellicle for lithography consisting essentially of a pellicle membrane and a pellicle frame, the pellicle membrane stretched on the pellicle frame comprises an amorphous perfluoropolymer and the terminal groups of the perfluoropolymer have been fluorinated.</p> |
