| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film magnetic head by which a magnetic pole part can be formed highly accurately within a short time. SOLUTION: An alumina layer is patterned to form a mask precursor, and then this mask precursor is subjected to etching by ion milling to form a first mask 22a. The width W2 of the part 22a(1) of the first mask 22a is made smaller than a minimum pattern width (about 0.3μm) formed by photolithography. Thus, by performing the above etching, the width of the art 22a(1) of the first mask 22a is narrowed. |
