发明名称 PLASMA PROCESSING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To supply high frequency electric power to a plurality of processing chambers equally from one high frequency power supply. SOLUTION: High frequency electric power is distributed to a plurality of the processing chambers 1, 2 through an electricity supply line 10 from one set of the high frequency power supply 5. Variable capacitors C1, C2 are inserted in distribution lines 7, 8 which branch arborescently from the electricity supply line 10. Current detection devices CT1, CT2 which detect the current which flows to each of variable capacitors C1, C2 are equipped. A difference of the detection values of the current detection devices CT1, CT2 is detected, and a control output is taken out from a control part 16 to the variable capacitors C1, C2 so that the difference may become zero, and the values of the variable capacitors C1, C2 are controlled.
申请公布号 JP2001267098(A) 申请公布日期 2001.09.28
申请号 JP20000084198 申请日期 2000.03.24
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YASHIMA SHINJI;TAKEBAYASHI MOTONARI
分类号 H05H1/46;H01L21/302;H01L21/3065;H02J3/46 主分类号 H05H1/46
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