发明名称 |
Phenol novolak resin, production process thereof, and positive photoresist composition using the same |
摘要 |
A phenol novolak resin has a peak intensity ratio of ortho-ortho bond (o-o)/ortho-para bond (o-p)/para-para bond (p-p) in a resin structure not substantially varying in each molecular weight fraction and has a weight average molecular weight (Mw) of 3000 to 20000 in terms of polystyrene, which peak intensity ratio is detected by 13C-NMR analysis. The phenol novolak resin can form both dense pattern and isolation pattern with good shapes in the formation of a fine resist pattern of not more than 0.35 mum and has satisfactory sensitivity, definition, and focal depth range properties, and has a resin composition being uniform in each molecular weight fraction. A process for producing the phenol novolak resin, and a positive photoresist composition using the resin are also provided.
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申请公布号 |
US2001024762(A1) |
申请公布日期 |
2001.09.27 |
申请号 |
US20010793958 |
申请日期 |
2001.02.28 |
申请人 |
MIYAGI KEN;OHUCHI YASUHIDE;HIRATA ATSUKO;DOI KOUSUKE;KOHARA HIDEKATSU;NAKAYAMA TOSHIMASA |
发明人 |
MIYAGI KEN;OHUCHI YASUHIDE;HIRATA ATSUKO;DOI KOUSUKE;KOHARA HIDEKATSU;NAKAYAMA TOSHIMASA |
分类号 |
C08G8/10;C08G14/04;G03F7/023;(IPC1-7):G03F7/023;G03F7/30 |
主分类号 |
C08G8/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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