PLASMA TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma treatment method which is capable of assuring good treatment quality by suppressing the reoxididation after a plasma treatment. SOLUTION: In the plasma treatment method for removing the oxidized films on electrode surfaces by subjecting a substrate formed with the electrodes consisting of copper or copper alloy to the plasma treatment, the substrate is subjected to the plasma treatment by using plasma-generating gas containing gaseous hydrogen which is reducing gas and thereafter the substrate is rested for a prescribed time and is subjected to aging to cool the substrate to ordinary temperature while the supply of the plasma-generating gas is continued. As a result, the direct contact of the cleaned surface right after the plasma treatment with oxygen is prevented and the progression of the reoxidation may be suppressed.