CHEMICAL VAPOR DEPOSITION PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS,申请号EP19940923294-传众专利搜索

发明名称	CHEMICAL VAPOR DEPOSITION PROCESS FOR FABRICATING LAYERED SUPERLATTICE MATERIALS
摘要	A substrate is prebaked in an oxygen furnace. A thin film of layered superlattice oxide is formed on the substrate by a chemical vapor deposition process. The film is RTP baked to provide grains with a mixed phase of A-axis and C-axis orientation. The film may be treated by ion implantation prior to the RTP bake and oxygen furnace annealed after the RTP bake. An electrode is deposited on the layered superlattice thin film and then the film and electrode are oxygen furnace annealed.
申请公布号	EP0708983(B1)	申请公布日期	2001.09.26
申请号	EP19940923294	申请日期	1994.06.30
申请人	SYMETRIX CORPORATION;OLYMPUS OPTICAL CO., LTD.	发明人	PAZ DE ARAUJO, CARLOS, A.;WATANABE, HITOSHI;SCOTT, MICHAEL, C.;MIHARA, TAKASHI
分类号	C30B29/10;C23C16/02;C23C16/40;C23C16/56;C23C18/12;C30B7/00;C30B25/02;C30B29/68;C30B31/22;C30B33/02;H01C7/10;H01L21/02;H01L21/314;H01L21/316;H01L21/822;H01L21/8242;H01L21/8247;H01L27/04;H01L27/108;H01L27/115;H01L29/788;H01L29/792	主分类号	C30B29/10
代理机构		代理人
主权项
地址