发明名称 |
X-RAY ANALYZER HAVING MECHANISM FOR OBSERVING SURFACE OF SAMPLE |
摘要 |
PURPOSE: To provide an X-ray analyzer capable of clearly observing the shape of the contaminated region, dropping mark or the like on the surface of a sample under a dark field in such a state that the sample is set to the X-ray analyzer. CONSTITUTION: In the X-ray analyzer l for irradiating the sample 3 with X-rays 4 in a chamber 2 to perform the analysis of the sample 3, a visual confirmation device 11 for visually confirming the sample 3 and an illumination means 31 for allowing illumination light B to be obliquely incident on the surface of the sample to illuminate the surface of the sample 3 while suppressing the incidence of the reflected light of the illumination light B on the visual confirmation device 11 are provided. By this constitution, the shape of the contaminated region, dropping mark or the like on the surface of the sample 3 can be clearly observed by the visual confirmation device 11 while the sample 3 is set to the X-ray analyzer 1.
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申请公布号 |
KR20010088425(A) |
申请公布日期 |
2001.09.26 |
申请号 |
KR20010011649 |
申请日期 |
2001.03.07 |
申请人 |
RIGAKU INDUSTRIAL CORPORATION |
发明人 |
IKESHITA AKIHIRO;KOJIMA SHINJIRO;SEGAWA TAKAO;YAMAGAMI MOTOYUKI |
分类号 |
G01N23/223;G01N23/04;H01L21/66;(IPC1-7):G01N23/223 |
主分类号 |
G01N23/223 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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