发明名称 LIGHT VALVE DEVICE, MANUFACTURING METHOD THEREOF, AND IMAGE PROJECTION SYSTEM USING THE SAME
摘要 PURPOSE: A light valve device, a manufacturing method thereof, and an image projection system using the same are provided to be capable of considerably increasing pixel density and improving the performance of the light valve device. CONSTITUTION: A semiconductor device includes a light valve substrate(71). At this time, the light valve substrate includes a transparent support substrate(15), a thin film structure(1) having an integrated transistor group, and an adhesive layer(14) for attaching the thin film structure to the transparent support substrate. At this time, each transistor of the integrated transistor group is made of a channel forming region(5), a source region(6), a drain region(7), a gate oxide layer(8) and a gate electrode(9). The semiconductor device further includes a liquid crystal layer(76) formed on the light valve substrate and an opposite substrate(74).
申请公布号 KR100311340(B1) 申请公布日期 2001.09.25
申请号 KR19990044494 申请日期 1999.10.14
申请人 SEIKO INSTRUMENTS INC. 发明人 TAKAHASHI KUNIHIRO;KOJIMA YOSHIKAZU;TAKASU HIROAKI;MATSUYAMA NOBUYOSHI;NIWA HITOSHI;YOSHINO TOMOYUKI;YAMAZAKI TSUNEO
分类号 H01L29/78;G02F1/1335;G02F1/1362;H01L21/336;H01L21/762;H01L21/77;H01L21/84;H01L29/786;(IPC1-7):H01L29/78 主分类号 H01L29/78
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