| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a device and a resist material used in the method. SOLUTION: The resist material contains a polymer used in combination with a dissolution inhibitor and a photo-acid generating agent(PAG). The dissolution inhibitor is an aliphatic carboxylic acid derivative having two or more acid labile groups and a third substituent (acid labile groups and a saturated linear, branched, cyclic or alicyclic <=18C hydrocarbon group, an oxyalkyl group, a sulfur-containing group or a hydrophilic group having a hydroxy or cyano group). The polymer may have an acid labile group which significantly lowers the solubility of the polymer in an aqueous base solution. A film of the resist material is formed on a substrate and exposed to delineating radiation. This radiation induces a chemical change by which the exposed resist material is made more soluble in the aqueous base solution than the unexposed part of the resist material. An image introduced into the resist material is developed as usual and transferred to the underlying substrate. |
