发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To stabilize temperature inside a reaction tube by shielding the radiant heat of the reaction tube, to enhance product quality, at the same time, to expand a product wafer region for improving productivity, to reduce the number of dummy wafers for cutting down manufacturing costs, and to decrease the contamination source of the product wafer. SOLUTION: At least, the upper necessary area of a reaction tube 14 is allowed to be opaque 16.
申请公布号 JP2001257167(A) 申请公布日期 2001.09.21
申请号 JP20000068165 申请日期 2000.03.13
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 SHIMADA TOMOHARU
分类号 H01L21/302;H01L21/205;H01L21/22;H01L21/306;(IPC1-7):H01L21/205 主分类号 H01L21/302
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