LOCAL WET-ETCHING DEVICE FOR SEMICONDUCTOR CIRCUIT AND METHOD FOR MANUFACTURING FINE TUBE USED IN THE SAME

摘要

PURPOSE: A local wet-etching device for semiconductor circuit and a method for manufacturing a fine tube used in the same are provided to etch partially a silicon substrate by injecting an etching solution into a fine tube. CONSTITUTION: A process stage(190) shifts a wafer(210) to an x-axis or a y-axis. An etching solution cartridge(110) stores an etching solution. An etching solution injection tube(100) exposes the etching solution on a local region of a semiconductor substrate. An etching solution cartridge support portion(120) supports the etching solution cartridge(110). A z-axis mobile bar(130) is connected with the etching solution cartridge support portion(120) and a main body(150). A z-axis motor(140) shifts the z-axis mobile bar(130). A process stage support and shift portion(170) supports and shifts the process stage(190).