| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a device for detecting defects of a transfer mask capable of detecting defects such as foreign matters and a projection on a pattern opening of the transfer mask. SOLUTION: The device for detecting defects of the transfer mask comprises an electron gun 10 for irradiating an electron beam, a stage 40 for driving and mounting the transfer mask 50, a passing electron detector 20 for detecting passing electrons of the transfer mask 50, a secondary electron detector 30 for detecting secondary electrons of the transferring mask 50, a defect extracting part 70 for taking the passing electron signal and a secondary electron signal obtained by the passing electron detector 20 and the secondary electron detector 30 and determining whether a defect exists by comparing with a reference signal, a display part 80 for displaying the defect as an image, and a device control part 60 for driving and controlling whole the detecting device and each unit.</p> |
