| 摘要 |
PURPOSE: A cleaning system is provided to clean a multitude of wafer within a short time by using a rotary portion for rotating a multitude of wafer carrier. CONSTITUTION: A cleaning tank(110) is filled by cleaners(103). A multitude of wafer is loaded on a multitude of wafer carrier(102,102a,102b). A carrier loading portion(121) loads the wafer carriers(102,102a,102b). A rotary portion(120) rotates the wafer carriers(102,102a,102b). Each wafer carrier(102,102a,102b) is soaked into of the cleaning tank(110) by the rotary portion(120). The wafers loaded on the wafer carriers(102,102a,102b) are cleaned by the cleaners(103), respectively.
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