发明名称 COMPOSITION FOR FORMING THIN METAL OXIDE FILM
摘要 <p>A composition from which a thin metal oxide film containing zirconium oxide as the main component can be easily formed on a surface of a substrate. The composition comprises a zirconium ingredient and one or more ingredients of a metal other than zirconium. The zirconium ingredient is a salt of an amine with a zirconium complex or zirconium salt formed from an aminopolycarboxylic acid and a zirconium compound. The ingredients of a metal other than zirconium are compounds of a metal other than zirconium. In the composition, the proportion of the zirconium ingredient is 70 to 98 mol% in terms of zirconium oxide and that of the ingredients of a metal other than zirconium is 2 to 30 mol% in terms of the oxide of the metal, based on all the metal ingredients. By using the composition, a member having a thin metal oxide film excellent in chemical stability, thermal stability, and mechanical strength is obtained.</p>
申请公布号 WO2001068529(P1) 申请公布日期 2001.09.20
申请号 JP2001001699 申请日期 2001.03.05
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