发明名称 METHOD AND DEVICE FOR PROCESSING PFC
摘要 A method and device for processing PFC, in which a vacuum pump is not caused to damage, maintenance and inspection are easy and burning treatment is not required. Continuously arranged after a vacuum chamber (12) through pipes (14) are a vacuum pump (16), a reaction gas introducing section (17), a plasma treatment section (18), and a polymer recovering section (20), thus constituting a processing device (10).
申请公布号 WO0168224(A1) 申请公布日期 2001.09.20
申请号 WO2001JP01794 申请日期 2001.03.07
申请人 SEIKO EPSON CORPORATION 发明人 NAMOSE, ISAMU
分类号 B01D53/34;B01D53/70;B01J19/08;B04C5/14;B04C5/15;C07B35/06;C07B37/06;C07B61/00;C23C16/44;H01L21/205;(IPC1-7):B01D53/70 主分类号 B01D53/34
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