发明名称 COATING DEVICE AND COATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a coating device capable of forming desired gas flow between a rotating treating vessel and an outside vessel fixedly provided in the outside thereof. SOLUTION: This coating device for applying a coating liquid on the surface of a substrate G has the treating vessel 43 having an opening part on the upper side and housing the substrate G, a coating liquid discharge nozzle 73 for discharging the coating liquid on the substrate G in the treating vessel 43, rotary means 40, 41 and 42 for rotating the treating vessel 43 and the substrate G, a 1st cap body 46 for closing the opening of the treating vessel 43, the outside vessel 44 fixedly provided outside the treating vessel 43 and having the opening and a 2nd cap body 47 for closing the opening of the outside vessel 44. An air introducing port 51 is provided in the 2nd cap body 47 to enable to control the gas flow between the treating vessel 43 and the outside vessel 44.
申请公布号 JP2001252608(A) 申请公布日期 2001.09.18
申请号 JP20000069059 申请日期 2000.03.13
申请人 TOKYO ELECTRON LTD 发明人 TATEYAMA KIYOHISA;MOTODA KIMIO
分类号 G03F7/16;B05C11/08;B05D1/40;B05D7/00;H01L21/027 主分类号 G03F7/16
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