Sidelobe suppressing phase shift mask and method

摘要

A phase shift mask and a method of designing a phase shift mask involves simulation of light exposure through the mask layout in order to identify sidelobe regions. The method includes modification of the mask layout to remove the sidelobe regions. The method of modification may be based upon the size and/or the maximum of light intensity in a given sidelobe region. The method may utilize an iterative process of modifying the mask layout and simulating exposure through the modified mask layout until a threshold criterion such as the non-existence of sidelobe regions is met.