CLEANING EQUIPMENT FOR SUPPLYING FLUORIC SOLUTION DILUTED AT PRECISE DILUTION RATIO

摘要

PURPOSE: A cleaning equipment for supplying fluoric solution diluted at a precise dilution ratio is to fabricate the fluoric solution diluted at the precise dilution ratio to use the fluoric solution in a cleaning process of a wafer. CONSTITUTION: A fluorine gas supplying portion supplies fluorine gas through a fluorine gas supplying pipe. A wafer to be cleaned is disposed in a cleaning bath(100). A diffuser(200) is connected through a circulating pipe(310,350) to the cleaning bath and also connected to the fluorine gas supplying pipe to dissolve the fluorine gas in solvent supplied through the circulating pipe from the cleaning bath and thus fabricate diluted fluoric solution. The fabricated fluoric solution is supplied through the circulating pipe to the cleaning bath. A cleaning equipment further has a controlling valve(470) and a regulator(450) disposed at the fluorine gas supplying pipe to supply a desired amount of fluorine gas.