NEGATIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a new negative type resist composition having improved sensitivity and resolution. SOLUTION: In the negative type resist composition, the molecular weight dispersity of a part insolubilized by exposure is 1-2. The composition contains a base resin comprising an alkali-soluble polymer, a photo-acid initiator capable of generating an acid when it absorbs radiation for image formation and degrades and an alicyclic alcohol having a reactive moiety capable of performing dehydration bonding reaction with the alkali-soluble group of the base resin in the presence of the acid generated from the photo-acid initiator.