| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask and method for measuring optical aberration for enabling the optical aberration to be measured rapidly and accurately by automating the measurement of the best focus position of a measurement pattern that is required for measuring optical aberration. SOLUTION: The method for measuring the optical aberration of an optical system based on a measured best focus position exposes a measurement pattern P1 on a mask M for measurement to a measurement wafer by an optical system for measuring optical aberration, and measures the best focus position of the pattern for measurement by the optical system for the obtained photo resist pattern. The measurement pattern P1 is composed so that it includes a line part PL2 that is composed of a plurality of liens L1-L7 that are arranged with specific pitch, and the plurality of lines L1-L7 are composed so that the line width gradually increases from one to the other. The best focus position can be obtained by measuring the line width of the photo resist pattern corresponding to the line part PL2 by a pattern recognition device or the like, the best focus position can be measured automatically, and optical aberration can be measured rapidly and accurately.</p> |
