SUBSTRATE TREATING DEVICE

摘要

PROBLEM TO BE SOLVED: To prevent treatment irregularity caused by the support of a substrate and to perform uniform treatment by positively generating the relative rotary force of the substrate to such rotary member as a turn table for rotating the substrate. SOLUTION: In the substrate treating device, a turn table 3 is provided with a plurality of regulation members 19 for regulating movement in a horizontal direction in contact with the edge of a substrate W rotatably. Since the plurality of regulation members 19 can be rotated, the substrate W slides for the plurality of regulation members 19 by constant acceleration/deceleration and the supply of treatment liquid and performs relative rotation for the turn table 3, thus preventing the regulation members 19 from staying in contact with the same position of the substrate edge and preventing treatment irregularities caused by the support of the substrate W, and hence performing uniform treatment.