| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching composition for an aluminum-containing material with which high etching precision, particularly, high linear working precision can be obtained without causing pitting corrosion while a high etching speed (high etch rate) is held in etching for an aluminum-containing material. SOLUTION: This etching composition for an aluminum-containing material is composed of an aqueous solution containing, as essential components, (a) phosphoric acid of 15 to 30 wt.% on dry basis, (b) hydrogen chloride of 10 to 25 wt.% on dry basis and (c) a surfactant of 0.001 to 0.05 wt.%.
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