发明名称 |
Photomask having small pitch images of openings for fabricating openings in a semiconductor memory device and a photolithographic method for fabricating the same |
摘要 |
A photomask having small pitch images of openings for fabricating an opening of a semiconductor memory device includes a plurality of images of openings arranged in a row direction with a predetermined pitch to be used to transfer the images of openings onto a photoresist layer, and is used for a photolithographic process employing a photoresist flow process. The distance between the centers of the images of openings arranged in the photomask is larger than the pitch. A photolithographic method for fabricating reduced size openings and a semiconductor memory device having openings fabricated using the same method is also provided.
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申请公布号 |
US2001021490(A1) |
申请公布日期 |
2001.09.13 |
申请号 |
US20010783064 |
申请日期 |
2001.02.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE JUNG-WOO;KIM HAK |
分类号 |
H01L21/027;G03F1/14;G03F7/40;(IPC1-7):G03F7/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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地址 |
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