Method of fabricating contact window

摘要

A method of fabricating a contact window. On semiconductor substrate having a conductive region, a dielectric layer is formed to cover the substrate and the conductive region. A gettering layer is formed on the dielectric layer. A hard mask layer is formed on the gettering layer. The hard mask layer is patterned to expose a part of the gettering layer which is right on top of the conductive region. The exposed gettering layer and the dielectric layer under the exposed gettering layer are removed to form the contact window.