Dual mask process for making second pole piece layer of write head with high resolution narrow track width second pole tip

摘要

A method of making a second pole piece layer that has a yoke portion between a pole tip portion and a back gap portion comprising the steps of forming a first photoresist layer that is sensitive to a first bandwidth of light, forming a second photoresist layer on the first photoresist layer that is sensitive to a second bandwidth of light that is different from the first bandwidth of light, after forming the first and second photoresist layers, photopatterning the second photoresist layer with the second bandwidth of light to provide an opening at pole tip, yoke and back gap sites wherein the pole tip, yoke and back gap sites define perimeters for the pole tip, yoke and back gap portions respectively, after photopatterning the second photoresist layer, photopatterning the first photoresist layer with the first bandwidth of light to provide openings at the pole tip, yoke and back gap sites and then plating the pole tip, yoke and back gap portions of the second pole piece layer in the openings of the first and second photoresist layers.