发明名称 EXPOSURE MASK AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To solve doughnut problem, leaf problem, aspect ratio problem, and inter-pattern connection problem which occur in a stencil mask. SOLUTION: It is judged whether a doughnut problem, a leaf problem, or an aspect ratio problem occurs in a mask pattern, the mask pattern is divided into two patterns, when it is found that a problem occurs, and the two patterns are allotted to two masks. When one of the problems occurs, the pattern of one of the masks is partially allotted to the other mask. When no doughnut problem and no leaf problem occur, it is determined for each mask as to whether an aspect ratio problem occurs, when it is found that an aspect ratio problem has occurred, the pattern of one of the masks is partially allotted to the other mask. When it is found that no aspect ratio problem occurs, it is determined whether a connection failure occurs to a pattern connection, and when it is found that a connection failure has occurred, an auxiliary pattern is provided to a pattern connection.</p>
申请公布号 JP2001244192(A) 申请公布日期 2001.09.07
申请号 JP20000060393 申请日期 2000.03.01
申请人 NEC CORP 发明人 OBINATA HIDEO
分类号 G03F1/20;G03F7/00;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/20
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