发明名称 |
POSITIVE IMAGE FORMING METHOD AND DEVELOPER USED IN SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a positive image forming method in which superior contrast between image and non-image areas is ensured, the rate of a residual film in the image area is sufficiently kept, fringy stain is not caused and no sensitivity to light in the UV region and superior handleability under a white fluorescent lamp are ensured when a positive image forming material with a layer of a positive type photosensitive composition comprising a photothermal converting material and a novolak resin is developed and a developer used in the method. SOLUTION: In the positive image forming method, a positive image forming material with a layer of a positive type photosensitive composition comprising a photothermal converting material which absorbs light of a light source for imagewise exposure and converts it to heat, a surfactant and a novolak resin on the surface of the base is developed with an alkali developing solution containing a specified phosphoric ester compound having ethyleneoxy repeating structural units to form a positive image. The developing solution used in the method contains prescribed amounts of an alkali metallic hydroxide and an alkali metallic silicate and has a prescribed pH. |
申请公布号 |
JP2001242639(A) |
申请公布日期 |
2001.09.07 |
申请号 |
JP20000292464 |
申请日期 |
2000.09.26 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
HINO ETSUKO;MIZUKAMI JUNJI;TSURUYA YASUYUKI |
分类号 |
G03F7/004;B41C1/055;B41N1/14;G03F7/00;G03F7/32 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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