发明名称 SURFACE EMITTING SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING FOR SURFACE EMITTING SEMICONDUCTOR LASER
摘要 PROBLEM TO BE SOLVED: To provide a surface emitting semiconductor laser wherein polarizing direction of a laser light can be controlled and a manufacturing method of the semiconductor laser. SOLUTION: In the surface emitting semiconductor laser 100, a pillar-shaped part 110 is formed in a part of a resonator 120, which is formed by laminating a lower mirror 103, an active layer 105 and an upper mirror 117. The upper mirror 117 is contained in the pillar-shaped part 110 and includes a first semiconductor deposit layer 114 and a second semiconductor deposit layer 118 which is continuous with an outer side surface of the first semiconductor deposition layer 114. The second semiconductor deposit layer 118 includes a first semiconductor layer 118a, a second semiconductor layer 118b, a barrier layer 118c and a current constriction layer 111. The first semiconductor deposit layer 114 includes a fist semiconductor layer 114a, a second semiconductor layer 114b and a current catchment basin layer 107a.
申请公布号 JP2001244563(A) 申请公布日期 2001.09.07
申请号 JP20000053001 申请日期 2000.02.29
申请人 SEIKO EPSON CORP 发明人 KANEKO TAKESHI;KONDO TAKAYUKI;NISHIDA TETSURO
分类号 H01S5/183;(IPC1-7):H01S5/183 主分类号 H01S5/183
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