发明名称 Process for forming a layer on a substrate comprises coupling electromagnetic radiation energy with microwave frequency to form a plasma and electromagnetic energy of lower frequency, and removing reaction products
摘要 Process for forming a layer on a substrate (3) in a reactor (1) comprises introducing a layer forming material into the reactor and coupling electromagnetic radiation energy with microwave frequency to form a plasma and electromagnetic energy of lower frequency. Both frequencies are pulsed so that reaction products are removed from the reactor during the impulse pause. An Independent claim is also included for a device for carrying out the above process comprising a microwave generator (9) for the production of the microwave frequency and an RF generator (7) for the production of the lower frequency. An electronic controller controls both generators. Preferred Features: Both frequencies are synchronously pulsed. The duration of the impulse pause is 3-300 times longer than the impulse duration.
申请公布号 DE10000663(A1) 申请公布日期 2001.09.06
申请号 DE20001000663 申请日期 2000.01.11
申请人 SCHOTT GLAS 发明人 DANIELZIK, BURKHARD;KLIPPE, LUTZ;KUHR, MARKUS;LOHMEYER, MANFRED;MOEHL, WOLFGANG;BECKER, OTMAR
分类号 C03C17/00;C03C17/245;C23C16/40;C23C16/515;C23C16/517;(IPC1-7):C23C16/515;C23C16/511 主分类号 C03C17/00
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