发明名称 Method for producing co-planar surface structures
摘要 A method for producing co-planar surface areas is disclosed. At first a first layer with at least one recess is provided. Onto the first layer a second layer is deposited over the entire area of the first layer wherein the second layer has a thickness greater than the depth of the recess. The second layer is composed of material different to the material of the first layer. The next step removes the second layer completely beyond the area of at least one recess. The remaining portion of the second layer is removed until the second layer is coplanar with the first layer.
申请公布号 US6284560(B1) 申请公布日期 2001.09.04
申请号 US19980215973 申请日期 1998.12.18
申请人 EASTMAN KODAK COMPANY 发明人 JECH, JR. JOSEPH;LEBENS JOHN A.;BRAZAS, JR. JOHN C.
分类号 B81C1/00;H01L21/306;(IPC1-7):H01L21/302 主分类号 B81C1/00
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