| 摘要 |
PURPOSE: A chemical amplified resist composition is provided to accomplish excellent compatibility with general resist resin, transparency and thermal stability in a desired temperature range of resist processing stage by comprising a multi-membered copolymer and a specific additive together with other acid generating agent and solvent. CONSTITUTION: The resist composition comprises 100 part by weight a multi-membered copolymer having the following formula(I) (wherein X, Y are formed by different units as monomers selected from a group consisting of the following formulas(II),(III) and (IV); l, m, n and o represent repeating unit numbers of the polymer and 0=<l/(l+m+n+o)=<0.5, 0=<m/(l+m+n+o)=<0.5, 0=<n/(l+m+n+o)=<0.35, 0.4=<o/(l+m+n+o) =<0.6 and 0.15=<(l+m)/(l+m+n+o)=<0.5), 3,000-50,000 Mw and 1.0-3.0 of Mw/Mn distribution and 5-50 part by weight of a low molecular weight compound additive having the following formula(V). The composition further includes 0.3-10 part by weight of acid generating agent and solvent.
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