发明名称 CERAMIC SUBSTRATE FOR SEMICONDUCTOR MANUFACTURING/ INSPECTING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a ceramic substrate for semiconductor manufacturing/ inspecting devices that can prevent clean spots from being generated on the ceramic substrate, and can control a heating surface at uniform temperature even if the ceramic substrate is used at 200 deg.C or higher. SOLUTION: On the ceramic substrate for semiconductor manufacturing/ inspecting device where a resistance electrical heating element consisting of one or at least two circuits is provided, an external terminal is connected to the end of the circuit, a lead wire in connected to the external terminal, and the connection part between the external terminal and the lead wire is covered with an insulation covering material.</p>
申请公布号 JP2001237301(A) 申请公布日期 2001.08.31
申请号 JP20000044565 申请日期 2000.02.22
申请人 IBIDEN CO LTD 发明人 ITO ATSUSHI
分类号 H01R4/58;H01L21/66;H01L21/68;H01L21/683;H01R4/02;H05B3/84;(IPC1-7):H01L21/68 主分类号 H01R4/58
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