METHOD FOR MANUFACTURING ELECTROOPTICAL DEVICE, ELECTROOPTICAL DEVICE AND PROJECTION TYPE DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrooptical device high in display quality and reliability, capable of manufacturing the electrooptical device with high productivity by efficiently and selectively removing an alignment layer formed on a substrate and to provide an electrooptical device and a projection type display device using the electrooptical device. SOLUTION: In the electrooptical device 1, alignment layers 24 and 25 are formed on a TFT array substrate 10 and a counter substrate 20 by a spin coating method, then the alignment layers 24 and 25 in the regions to overlap a sealing material 52 and in their outer peripheral regions are irradiated with atmospheric pressure plasma to be removed and then the TFT array substrate 10 and the counter substrate 20 are stuck by using the sealing material 52. At this time, the plasma is generated by an oxygen gas indirect discharging method as the atmospheric pressure plasma.